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SPUTTERING

SYSTEMS UTILIZING MAGNETRON SPUTTERING
The Cryofox Sputtering series consist of vacuum deposition systems utilizing magnetron sputtering deposition. The systems come in both single and split chamber versions, wich are both suitable for small scale production of high-end components as well as for R&S projects. It is possible to choose between a mix of DC, RF, Bi-polar, and HiPIMS technologies for each of the systems. The number, size, and position of the magnetrons can be chosen individually to meet the demands of the most advanced processes.

polyteknik





Sputter

DISCOVERY 501 DUAL SIDE

Small scale production by deposition
of advanced multi layer structures


Discovery 501 Dual Side
Discovery 501 Dual Side
The Cryofox Discovery 501ds is a single chamber thin film deposition unit, equipped with up to four rectangular magnetrons or a large number of smaller circular magnetrons. With this configuration of magnetrons, it is possible to deposit multi layer structures from two sides at the same time without breaking the vacuum. This system can handle both odd shaped substrates and wafers up to 8". It is primarily a system for small scale production of high-end electronics or optics.
  • Single chamber system
  • Up to eight 4" wafers per batch
  • Maximum four rectangular magnetrons
Cryofox Discovery DS Magnetron Cryofox Discovery DS Magnetron
Magnetrons illustration Magnetrons illustration
Magnetrons
 x2
Wafers
 x8
Click here to download Technical Specifications for Discovery 501 Dual Side





Sputter




DISCOVERY 400

Compact system for research and
development of advanced processes


Discovery 400
Discovery 400



The Cryofox Discovery 400 is a single chamber thin film deposition unit equipped with up to four circular magnetrons. Because of the position of the magnetrons, it is possible to do alloy layers by co-deposition from two or three sources. This gives the user total freedom to choose the composition of the layers from pure source materials and makes it the perfect research tool utilizing magnetron sputtering.
  • Single chamber system
  • Single 4" or 6" wafer per batch
  • Maximum four magnetrons
Magnetrons
 x2
Wafers
 x1
Click here to download Technical Specifications for Discovery 400