The Cryofox Discovery 500 is a single chamber thin film deposition unit, utilizing both e-beam deposition and magnetron sputtering deposition. Because both an e-beam source and magnetrons are founbd within the same chamber, it is possible to mix layers from all sources in the same batch, without breaking the vacuum. The system can deposit up to eight 4" wafers in one batch, which makes it suitable for small scale production system.

• Single chamber system
• Up to eight 4" wafers per batch
• Maximum one e-beam source and two magnetrons

The Cryofox Explorer 600 deposition system is a split chamber unit. Because of the two chambers the process chamber is not vented between batches. Because of this it is easy to keep the process chamber and source material free of contamination. It is possible to include both an e-beam source and up to two 3" magnetrons in the process chamber, which makes the Explorer 600 a very versatile research tool for various R&D projects.

• Split chamber system with load lock
• Single 4" or 6" wafer per batch
• Maximum one e-beam source and two magnetrons

When no restriction on material compositions and layer stack combinations are desired, the Cryofox Explorer 700 is the perfect choice. In this system it is possible to do alloy layers from pure source materials using both co-e-beam deposition and co-sputtering deposition from two different sources at the same time. By using special lasercut masks, an almost perfect uniformity across a 6" wafer can be achieved. The unit can carry up to eight 4" wafers or four 6" wafers in one batch, which are easily changes without breaking the vacuum in the process chamber.

• Split chamber system with load lock
• Up to eight 4" wafers or four 6" wafer per batch
• Maximum two e-beam sources and four magnetrons